DocumentCode
1058730
Title
Annealing of degraded npn-transistors-mechanisms and modeling
Author
Wurzer, H. ; Mahnkopf, R. ; Klose, H.
Author_Institution
Inst. fur Phys., Bundeswehr Munchen Univ., Germany
Volume
41
Issue
4
fYear
1994
fDate
4/1/1994 12:00:00 AM
Firstpage
533
Lastpage
538
Abstract
We report on the annealing of degraded npn-transistors, which includes a new model describing the decrease of base current during annealing. We found that two mechanisms are responsible for annealing: the recombination of charges and the bonding of hydrogen atoms on interface traps. Furthermore, we show that a heating of the whole device and a forward biasing of the emitter-base-diode activate these annealing mechanisms. This biasing deactivates the interface traps by recombination with a part of the streaming charge and results in a local increase in temperature, caused by the current. Both local and global heating yield an additional thermal generation of charges and an increasing diffusivity of hydrogen atoms. Consequently, an additional deactivation and passivation of interface traps is detected
Keywords
annealing; bipolar transistors; electron traps; electron-hole recombination; hole traps; interface electron states; passivation; semiconductor device models; H atom bonding; annealing; base current; deactivation; degraded npn-transistors; emitter-base-diode; forward biasing; heating; interface traps; modeling; n-p-n devices; passivation; recombination; thermal generation; Annealing; Bipolar transistors; Bonding; Degradation; Electron traps; Heating; Hydrogen; Passivation; Stress; Temperature;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.278506
Filename
278506
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