• DocumentCode
    1058730
  • Title

    Annealing of degraded npn-transistors-mechanisms and modeling

  • Author

    Wurzer, H. ; Mahnkopf, R. ; Klose, H.

  • Author_Institution
    Inst. fur Phys., Bundeswehr Munchen Univ., Germany
  • Volume
    41
  • Issue
    4
  • fYear
    1994
  • fDate
    4/1/1994 12:00:00 AM
  • Firstpage
    533
  • Lastpage
    538
  • Abstract
    We report on the annealing of degraded npn-transistors, which includes a new model describing the decrease of base current during annealing. We found that two mechanisms are responsible for annealing: the recombination of charges and the bonding of hydrogen atoms on interface traps. Furthermore, we show that a heating of the whole device and a forward biasing of the emitter-base-diode activate these annealing mechanisms. This biasing deactivates the interface traps by recombination with a part of the streaming charge and results in a local increase in temperature, caused by the current. Both local and global heating yield an additional thermal generation of charges and an increasing diffusivity of hydrogen atoms. Consequently, an additional deactivation and passivation of interface traps is detected
  • Keywords
    annealing; bipolar transistors; electron traps; electron-hole recombination; hole traps; interface electron states; passivation; semiconductor device models; H atom bonding; annealing; base current; deactivation; degraded npn-transistors; emitter-base-diode; forward biasing; heating; interface traps; modeling; n-p-n devices; passivation; recombination; thermal generation; Annealing; Bipolar transistors; Bonding; Degradation; Electron traps; Heating; Hydrogen; Passivation; Stress; Temperature;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.278506
  • Filename
    278506