DocumentCode
105877
Title
Si wire array waveguide grating with parallel star coupler configuration fabricated by ArF excimer immersion lithography
Author
Okayama, Hideaki ; Shimura, Daisuke ; Takahashi, Hiroki ; Seki, Morihiro ; Toyama, Munehiro ; Sano, Tomomi ; Koshino, Keiji ; Yokoyama, Naoki ; Ohtsuka, Minoru ; Sugiyama, Akihiko ; Ishitsuka, S. ; Tsuchizawa, Tai ; Nishi, Hidetaka ; Yamada, Koji ; Yaegas
Author_Institution
Inst. for Photonics-Electron. Convergence Syst. Technol. (PECST), Japan
Volume
49
Issue
6
fYear
2013
fDate
March 14 2013
Firstpage
410
Lastpage
412
Abstract
An Si wire array waveguide grating wavelength demultiplexer fabricated using immersion ArF lithography is reported. The tilt directions of the input and output star couplers are aligned in the same direction to avoid phase error generated at the curved waveguides. A 16 channel device with 200 GHz wavelength spacing was fabricated.
Keywords
demultiplexing equipment; immersion lithography; waveguide couplers; wires (electric); ArF excimer immersion lithography; frequency 200 GHz; parallel star coupler configuration; phase error generation; wire array waveguide grating wavelength demultiplexer;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el.2013.0206
Filename
6485065
Link To Document