DocumentCode :
1061173
Title :
Functional modeling of integrated injection logic—Transient analysis
Author :
Rofail, Samir S. ; Elmasry, Mohamed I. ; Heasell, Edwin L.
Author_Institution :
University of Waterloo, Waterloo, Ont., Canada
Volume :
25
Issue :
9
fYear :
1978
fDate :
9/1/1978 12:00:00 AM
Firstpage :
1120
Lastpage :
1125
Abstract :
A transient analysis of integrated-injection logic I2L structures is presented. This analysis is based on calculating the different depletion and neutral region charges. Doping profile, high-level effects, and geometrical layout are taken into account. To formulate a transient functional model of the structure, regional transient delays are defined as ratios of the corresponding charges to the electron current density Jnof the n-p-n vertical transistor. An analytical expression is given for the dominant storage time; τepi. The ratio of the stored charges in a metal-covered and oxide-covered base region is related to the surface recombination velocity and the ratio of the corresponding current densities. In a partitioned CAD model (as in Berger´s injection model), the regional transient delays are expressed in terms of the corresponding current densities rather than Jn. The computed results for a five-state ring oscillator are compared to measurements.
Keywords :
Charge carrier processes; Current density; Delay; Doping profiles; Electrons; Epitaxial layers; Leakage current; Logic; Semiconductor process modeling; Transient analysis;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1978.19235
Filename :
1479629
Link To Document :
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