• DocumentCode
    106291
  • Title

    Low-Voltage Atmospheric-Plasma Generation by Utilizing Afterglow Initiation Carrier

  • Author

    Lee, Lun-Hui ; Youngmin Kim

  • Author_Institution
    Sch. of Electron. & Electr. Eng., Hongik Univ., Seoul, South Korea
  • Volume
    41
  • Issue
    1
  • fYear
    2013
  • fDate
    Jan. 2013
  • Firstpage
    155
  • Lastpage
    158
  • Abstract
    Low-voltage atmospheric-plasma generation is reported, in which the breakdown voltage is significantly reduced by utilizing afterglow ions generated on integrated electrodes. Using micromachining techniques, a microanode and two microcathodes were integrated on a glass substrate. Atmospheric glow discharge was first generated in the narrow gap of 10 μm, and the resulting afterglow ions were utilized as an initiation carrier in a subsequent discharge induced in the wide gap of 270 μm. In the presence of the initiation carrier, the atmospheric glow discharge was generated at a substantially low voltage. The feasibility of the proposed generation scheme as an efficient compact plasma source is also evaluated.
  • Keywords
    afterglows; electrodes; glow discharges; micromachining; plasma sources; afterglow initiation carrier; atmospheric glow discharge; breakdown voltage; glass substrate; integrated electrodes; low-voltage atmospheric-plasma generation; microanode; microcathodes; micromachining techniques; plasma source; size 10 mum; size 270 nm; Cathodes; Discharges (electric); Fault location; Glow discharges; Plasmas; Afterglow; atmospheric plasma; initiation carrier; plasma on a chip;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2012.2230275
  • Filename
    6395263