Simple process for 60 nm patterned nickel stamp replication

A simple process for nickel nanoimprint stamp replication is proposed. Based on this process, the replication of a 15 × 20 mm nickel nanoimprint stamp with 60 nm grating structures was carried out. First, the nanograting structures on the master silicon stamp were transferred to a polymer substrate using the hot embossing process; then, a layer of nickel was sputtered to fill the nanostructures on the substrate surface and form the seed layer for the electroforming process; finally, the back plane of the replica is electroformed. The observation results show good correlation between the dimensions of the master stamp×s features and the corresponding replicated features. The performance test result of the replicated stamp demonstrated that the mechanical strength of the replica is sufficient for the hot embossing process.