Simple process for 60 nm patterned nickel stamp replication

Author

Ran Zhang ; Jinkui Chu ; Jian Min ; Haixiang Wang ; Zhiwen Wang

Author_Institution

Key Lab. for Micro/Nano Technol. & Syst. of Liaoning Province, Dalian Univ. of Technol., Dalian, China

Volume

8

Issue

1

fYear

2013

fDate

Jan-13

Firstpage

5

Lastpage

7

Abstract

A simple process for nickel nanoimprint stamp replication is proposed. Based on this process, the replication of a 15 × 20 mm nickel nanoimprint stamp with 60 nm grating structures was carried out. First, the nanograting structures on the master silicon stamp were transferred to a polymer substrate using the hot embossing process; then, a layer of nickel was sputtered to fill the nanostructures on the substrate surface and form the seed layer for the electroforming process; finally, the back plane of the replica is electroformed. The observation results show good correlation between the dimensions of the master stamp×s features and the corresponding replicated features. The performance test result of the replicated stamp demonstrated that the mechanical strength of the replica is sufficient for the hot embossing process.

Keywords

electroforming; embossing; mechanical strength; nanofabrication; nanopatterning; nanostructured materials; nickel; replica techniques; sputtering; Ni; electroforming process; hot embossing process; master silicon stamp; master stamp dimensions; nanograting structures; nickel layer; nickel nanoimprint stamp replication; patterned nickel stamp replication; performance test; polymer substrate; replica back plane; replica mechanical strength; replicated stamp; seed layer; size 60 nm; sputtering; substrate surface;

fLanguage

English

Journal_Title

Micro & Nano Letters, IET

Publisher

iet

ISSN

1750-0443

Type

jour

DOI

10.1049/mnl.2012.0841

Filename

6485109