Basic technology for VLSI (part II)

This paper describes some of the recent work in the field of basic technology at VLSI Cooperative Laboratories. In microfabrication technology, a pair of high-speed electron-beam pattern delineators, electron-beam mask inspection, a pair of electron-beam projection systems, an X-ray lithography system, and electron-beam and X-ray resists are described. Thermally induced microdefects in silicon crystal are analyzed. A plasma etching system, basic testing and evaluation, and basic devices are also discussed.