• DocumentCode
    1071199
  • Title

    TP-A6 the behavior of Schottky barriers to GaAs as a function of annealing temperature

  • Author

    Hovel, H.J. ; Lanza, C.

  • Volume
    27
  • Issue
    11
  • fYear
    1980
  • fDate
    11/1/1980 12:00:00 AM
  • Firstpage
    2190
  • Lastpage
    2190
  • Keywords
    Annealing; Crystallization; Gallium arsenide; Molecular beam epitaxial growth; Schottky barriers; Silicides; Silicon; Substrates; Temperature; Tungsten;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1980.20213
  • Filename
    1481006