• DocumentCode
    1074348
  • Title

    The pressure dependence of the bistable voltage margin of an AC plasma panel cell

  • Author

    Sahni, Omesh ; Aboelfotoh, M.O.

  • Author_Institution
    IBM Thomas J. Watson Research Center, Yorktown Heights, NY
  • Volume
    28
  • Issue
    6
  • fYear
    1981
  • fDate
    6/1/1981 12:00:00 AM
  • Firstpage
    638
  • Lastpage
    644
  • Abstract
    The results of numerical simulations and experimental measurements are presented for the pressure dependence of the bistable voltage margin of an ac plasma panel cell. The measured dependence on gas pressure is correctly predictable only by modifying the previous theoretical models to incorporate a secondary emission coefficient for Ne2+ions which is about one-third the value fox Ne+ions. Further, the comparison between theory and experimental data indicates that the behavior of room temperature deposited MgO films can be explained by assuming a value of significant magnitude for the secondary emission coefficient for Ar+ions. This value would have to approach zero if the behavior of panels made with films deposited at a higher substrate temperature of about 250°C are to be consistently explained. Finally, a critical evaluation is presented of the extent of the theoretical understanding of relevant physical phenomena involved in the bistable behavior of ac plasma panels.
  • Keywords
    Argon; Cathodes; Dielectric substrates; Electron emission; Glass; Impact ionization; Plasma devices; Plasma measurements; Space charge; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1981.20406
  • Filename
    1481558