Title :
In-plane anisotropy studies in amorphous CoFeNb films
Author :
Contreras, M.C. ; Rivas, M. ; Iglesias, I. ; Corrales, J.A. ; Krishnan, R. ; Tessier, M.
Author_Institution :
Departamento de Fisica, Oviedo Univ., Spain
fDate :
11/1/1993 12:00:00 AM
Abstract :
Uniaxial anisotropy field, Hk, and local anisotropy fluctuation were studied as a function of argon pressure during deposition for RF sputtered amorphous CoFeNb films. Influence of PAr on anistropy field Hk, local anisotropy constant Kloc, and S (structure constant) is discussed. The magnitude of S and KlocV1/2 were found to be strongly dependent on P Ar
Keywords :
cobalt alloys; ferromagnetic properties of substances; iron alloys; magnetic anisotropy; magnetic fields; magnetic properties of amorphous substances; magnetic thin films; niobium alloys; sputtered coatings; CoFeNb; RF sputtered amorphous films; local anisotropy fluctuation; structure constant; uniaxial anisotropy field; Amorphous materials; Anisotropic magnetoresistance; Argon; Electrons; Fluctuations; Magnetic analysis; Magnetic anisotropy; Magnetic field measurement; Magnetic films; Saturation magnetization;
Journal_Title :
Magnetics, IEEE Transactions on
