DocumentCode :
1075817
Title :
S20 photocathodes grown by molecular-beam deposition
Author :
Massegu, N. ; Konrath, A. ; Barois, J.M. ; Christol, P. ; Tournié, E.
Author_Institution :
Photonis France, Brive
Volume :
44
Issue :
4
fYear :
2008
Firstpage :
315
Lastpage :
316
Abstract :
S20 photocathodes have been grown by solid-source molecular-beam deposition (MBD). The unactivated absorbing layer exhibits a maximum response of 29 mA/W at 430 nm while the photocathode shows a sensitivity and a quantum efficiency of 74 mA/W and 22% at 430 nm. This corresponds to a white sensitivity of 200 muA/lm which is already comparable to commercial S20 photocathodes. In addition, the MBD fabrication cycle takes five times less time than the actual industrial process.
Keywords :
molecular beams; photocathodes; MBD fabrication; S20 photocathodes; solid-source molecular-beam deposition; unactivated absorbing layer; white sensitivity;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20082829
Filename :
4455430
Link To Document :
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