DocumentCode :
1077065
Title :
35-nm Zigzag T-Gate \\hbox {In}_{0.52}\\hbox {Al}_{0.48} \\hbox {As/In}_{0.53}\\hbox {Ga}_{0.47}\\hbox {As} Metamorphic GaAs HEMTs W
Author :
Lee, Kang-Sung ; Kim, Young-Su ; Hong, Yun-Ki ; Jeong, Yoon-Ha
Author_Institution :
Pohang Univ. Sci. of & Technol., Pohang
Volume :
28
Issue :
8
fYear :
2007
Firstpage :
672
Lastpage :
675
Abstract :
Metamorphic GaAs high electron mobility transistors (mHEMTs) with the highest-f max reported to date are presented here. The 35-nm zigzag T-gate In0.52Al0.48As/In0.53Ga0.47As metamorphic GaAs HEMTs show f maxof 520 GHz, f T of 440 GHz, and maximum transconductance (g m) of 1100 mS/mm at a drain current of 333 mA/mm. The combinations of f max and f T are the highest data yet reported for mHEMTs. These devices are promising candidates for aggressively scaled sub-35-nm T-gate mHEMTs.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; submillimetre wave transistors; In0.52Al0.48As-In0.53Ga0.47As; frequency 440 GHz; frequency 520 GHz; maximum transconductance; metamorphic HEMT; metamorphic high electron mobility transistor; size 35 nm; zigzag T-gate; Cutoff frequency; Dielectric materials; Foot; Gallium arsenide; HEMTs; MODFETs; Resists; Transistors; Wet etching; mHEMTs; High-electron mobility transistor (HEMT); metamorphic; metamorphic high electron mobility transistor (mHEMT); nanometer scale T-gate; zigzag T-gate;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2007.901579
Filename :
4278365
Link To Document :
بازگشت