Title :
Plasma formation of buffer layers for multilayer resist structures
Author :
Dobkin, D.M. ; Cantos, B.D.
Author_Institution :
Watkins-Johnson Company, Palo Alto, CA
fDate :
9/1/1981 12:00:00 AM
Abstract :
Recently, Li and Richards described a plasma treatment which may be used to prevent intermixing of successive layers of positive resists. We have studied the characteristics of the fluorinated polymer layers produced by this process, and have used a modification of the process to perform multilayer lithography for device fabrication.
Keywords :
Buffer layers; Etching; Fabrication; Nonhomogeneous media; Plasma applications; Plasma displays; Plasma measurements; Plasma properties; Resists; Surface treatment;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1981.25411
