DocumentCode
1079529
Title
Laser annealing of ion implantation damage in semiconductors with KrF excimer laser radiation
Author
Hess, Laura
Author_Institution
Hughes Research Labs., Malibu, CA, USA
Volume
15
Issue
9
fYear
1979
fDate
9/1/1979 12:00:00 AM
Firstpage
990
Lastpage
990
Keywords
Laser applications, materials processing; Annealing; Backscatter; Chemical lasers; Crystalline materials; Crystallization; Gallium arsenide; Ion implantation; Optical materials; Semiconductor lasers; Silicon;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/JQE.1979.1070302
Filename
1070302
Link To Document