DocumentCode
108155
Title
Characteristics of Flexible Thin-Film Transistors With ZnO Channels
Author
Liang-Wen Ji ; Cheng-Zhi Wu ; Te-Hua Fang ; Yu-Jen Hsiao ; Teen-Hang Meen ; water, Wayne ; Zhe-Wei Chiu ; Kin-Tak Lam
Author_Institution
Grad. Inst. of Electro-Opt. & Mater. Sci., Nat. Formosa Univ., Yunlin, Taiwan
Volume
13
Issue
12
fYear
2013
fDate
Dec. 2013
Firstpage
4940
Lastpage
4943
Abstract
In this paper, we demonstrate the fabrication of ZnO-based thin-film transistors (TFTs) on flexible substrates (polyethylene terephthalate) through radio-frequency sputtering and low-temperature procedure. The device structure belongs to bottom-gate type TFTs where ZnO and HfO2 are used as channel and gate dielectric layer, respectively. XRD results show that the ZnO channel layers are hexagonal wurtzite structure with (002) orientation. The properties of the fabricated devices are also characterized within several environmental and physics conditions. It can be found that the flexible TFT device is with a low operating voltage and high current ON/OFF ratio; the gate leakage current and transparency are found to be ~12 nA and 75%, respectively. The gate leakage current (IG), drain-source current (IDS), ON/OFF current ratio (ION/OFF), threshold voltage (Vth), and field-effect mobility (μFE) are measured under different bending modes.
Keywords
X-ray diffraction; carrier mobility; flexible electronics; hafnium compounds; leakage currents; semiconductor device measurement; semiconductor thin films; sputter deposition; thin film transistors; wide band gap semiconductors; zinc compounds; XRD results; ZnO channel layers; ZnO-HfO2; ZnO-based TFT fabrication; bending modes; bottom-gate type TFT; device structure; drain-source current measurement; environmental conditions; field-effect mobility measurement; flexible TFT device; flexible substrates; flexible thin film transistor characteristics; gate dielectric layer; gate leakage current measurement; hexagonal wurtzite structure; high current ON/OFF ratio; low operating voltage; low-temperature procedure; physics conditions; polyethylene terephthalate; radiofrequency sputtering; threshold voltage measurement; Flexible electronics; polyethylene; zinc oxide;
fLanguage
English
Journal_Title
Sensors Journal, IEEE
Publisher
ieee
ISSN
1530-437X
Type
jour
DOI
10.1109/JSEN.2013.2267808
Filename
6541957
Link To Document