DocumentCode :
1082745
Title :
Simulations for the effect of chamber geometry on oxygen plasma characteristics for very large plasma sources
Author :
Takechi, Kazushige ; Otsuki, Shigeyoshi
Author_Institution :
Technol. Res. Assoc. for Adv. Display Mater., Tokyo
Volume :
19
Issue :
3
fYear :
2006
Firstpage :
286
Lastpage :
291
Abstract :
Using an oxygen discharge model based on diffusion equations, we numerically investigate the effect of chamber geometry on plasma density profiles, especially for very large rectangular high-density plasma chambers. The calculation results show that uniformity of the ion and O-atom density profiles seriously deteriorates when the chamber length increases up to 2 m. We discuss the dependence of the plasma density profiles on the chamber geometry in terms of the relationship between particle generation in the volume and loss at the wall surface. The simulation results indicate that the surface loss at the top and bottom chamber walls dominates the loss at the side walls. The density profiles, therefore, vary, depending on the chamber length even at the same aspect ratio. The simulation results also predict that the uniformity of the density profiles could be significantly improved over the very large area if the plasma were properly confined by using magnetic multipole fields, along with choosing suitable wall materials that influence the particle loss at the surface
Keywords :
plasma density; plasma materials processing; plasma simulation; plasma sources; chamber geometry effect; diffusion equations; electron temperature; magnetic multipole fields; oxygen discharge model; oxygen plasma characteristics; particle generation; particle loss; plasma chambers; plasma density profiles; surface loss; very large plasma sources; wall materials; Fault location; Geometry; Magnetic confinement; Magnetic materials; Plasma confinement; Plasma density; Plasma properties; Plasma simulation; Plasma sources; Solid modeling; Diffusion equation; electron temperature; large area plasma source; oxygen plasma; plasma density profile;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/TSM.2006.879417
Filename :
1668228
Link To Document :
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