Title :
Ion beam damage effects during the low energy cleaning of GaAs
Author :
Ghandhi, S.K. ; Kwan, P. ; Bhat, K.N. ; Borrego, J.M.
Author_Institution :
Rensselaer Polytechnic Institute, Troy, NY
fDate :
2/1/1982 12:00:00 AM
Abstract :
It is shown that ion-beam damage effects in GaAs are significant, even for low energy ion cleaning (≃ 100 eV). Damage from this process results in increasing the saturation current (extrapolated from the forward current) of Au-n-GaAs Schottky barrier diodes by two orders of magnitude. The depth of damage during this process is shown to be unexpectedly large (900 Å) for these low ion-beam energies.
Keywords :
Cleaning; Current density; Etching; Gallium arsenide; Ion beams; Photovoltaic cells; Schottky barriers; Schottky diodes; Substrates; Surface treatment;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1982.25473