DocumentCode :
1082794
Title :
Ion beam damage effects during the low energy cleaning of GaAs
Author :
Ghandhi, S.K. ; Kwan, P. ; Bhat, K.N. ; Borrego, J.M.
Author_Institution :
Rensselaer Polytechnic Institute, Troy, NY
Volume :
3
Issue :
2
fYear :
1982
fDate :
2/1/1982 12:00:00 AM
Firstpage :
48
Lastpage :
50
Abstract :
It is shown that ion-beam damage effects in GaAs are significant, even for low energy ion cleaning (≃ 100 eV). Damage from this process results in increasing the saturation current (extrapolated from the forward current) of Au-n-GaAs Schottky barrier diodes by two orders of magnitude. The depth of damage during this process is shown to be unexpectedly large (900 Å) for these low ion-beam energies.
Keywords :
Cleaning; Current density; Etching; Gallium arsenide; Ion beams; Photovoltaic cells; Schottky barriers; Schottky diodes; Substrates; Surface treatment;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1982.25473
Filename :
1482578
Link To Document :
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