Title :
Extended cyclability in electrically-alterable read-only-memories
Author :
DiMaria, D.J. ; Dong, D.W. ; Falcony, C. ; Brorson, S.R.
Author_Institution :
IBM T. J. Watson Research Center, Yorktown Heights, NY
fDate :
7/1/1982 12:00:00 AM
Abstract :
An electrically-alterable read-only-memory using silicon dioxide and silicon-rich silicon dioxide layers capable of being cycled ≳ 107times by minimizing electron charge trapping in the SiO2layers of the device by incorporation of small amounts of silicon is reported for the first time. Charge transfer to and from a floating polycrystalline silicon layer from a control gate electrode is accomplished by means of a modified dual-electron-injector-structure stack. This modified stack has the intervening silicon dioxide layer, which is sandwiched between silicon-rich silicon dioxide injectors, replaced by a slightly off-stoichiometric oxide containing between 1% and 6% excess atomic silicon above the normal 33% found in silicon dioxide. A brief discussion of a physical model which is believed to account for the observed phenomenon is given.
Keywords :
Associate members; Atomic layer deposition; Charge transfer; EPROM; Electrodes; Electron traps; Helium; Impurities; Photonic band gap; Silicon compounds;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1982.25534