DocumentCode :
1083845
Title :
Precise Grating Profile Evaluation for DFB Lasers Using an Optical Metrology
Author :
Muroya, Yoshiharu ; Makino, Shingo ; Umeda, Naoki ; Okuda, Tetsuro ; Ishikawa, Shin ; Komatsu, Keiro
Author_Institution :
NEC Electron. Corp., Kanagawa
Volume :
20
Issue :
3
fYear :
2007
Firstpage :
293
Lastpage :
298
Abstract :
A precise grating profile evaluation method for distributed-feedback (DFB) laser diodes was achieved using a simple optical metrology. Spectroscopic scatterometry, an optical-wavelength light-diffraction technique, is emerging as a fast, accurate, and nondestructive means of monitoring profiles. A photoresist grating pattern on an InP substrate and an etched InP grating with periods of 0.2 and 0.24 mum were successfully evaluated by using unpolarized simple optical metrology. A precise grating profile evaluation technique with an accuracy of nanometers enabled us to obtain an accurate coupling coefficient (kappaL) for DFB laser diodes. DFB laser diodes with well-controlled kappaL are very promising for practical use in cost-effective optical networks.
Keywords :
III-V semiconductors; diffraction gratings; distributed feedback lasers; indium compounds; semiconductor device testing; semiconductor lasers; wide band gap semiconductors; InP - Surface; distributed-feedback laser diode; grating profile evaluation; optical metrology; optical network; optical-wavelength light-diffraction technique; photoresist grating pattern; process control; spectroscopic scatterometry; Diode lasers; Etching; Gratings; Indium phosphide; Metrology; Monitoring; Optical scattering; Radar measurements; Resists; Spectroscopy; Distributed feedback lasers (DFB LDs); grating; optical metrology; process control; scatterometry;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/TSM.2007.901402
Filename :
4285832
Link To Document :
بازگشت