Title :
Linear CCD-Imagers with a polyimide insulation for double level metallization
Author :
Theuwissen, A.J.P. ; Declerck, G.J.
Author_Institution :
Catholic University Leuven, Heverlee, Belgium
fDate :
10/1/1982 12:00:00 AM
Abstract :
CCD-imagers have been fabricated with a double metallization and with polyimide (PI) as insulating layer between the two metals. The incorporation of PI reduces the complexity of the CCD-technology without changing the electrical and the optical properties of the imaging devices. In addition, the sensor uniformity is strongly improved due to the enhanced surface flatness.
Keywords :
Aluminum; Atmosphere; Insulation; Metallization; Optical sensors; Plasma temperature; Polyimides; Surface topography; Threshold voltage; Wet etching;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1982.25579
