DocumentCode :
1085799
Title :
An analytic characterization of weak-inversion drift current in a long-channel MOSFET
Author :
Lim, Hyung-Kyu ; Fossum, Jerry G.
Author_Institution :
University of Florida, Gainesville, FL
Volume :
30
Issue :
6
fYear :
1983
fDate :
6/1/1983 12:00:00 AM
Firstpage :
713
Lastpage :
715
Abstract :
A weak-inversion drain-current model that accounts for both drift and diffusion of carriers in a long-channel MOSFET is derived. The drift current increases exponentially with surface potential, and for typical silicon MOSFET´s the drift-diffusion current ratio is about 0.2 at threshold. From the model a simple analytic threshold current expression is obtained that facilitates a quick experimental determination of the threshold voltage.
Keywords :
Argon; Etching; Gallium arsenide; MOSFET circuits; Milling; Mirrors; Nitrogen; Semiconductor lasers; Surface contamination; Threshold current;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1983.21195
Filename :
1483096
Link To Document :
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