DocumentCode :
1087326
Title :
Tunneling in base-emitter junctions
Author :
Stork, Johannes M C ; Isaac, Randall D.
Author_Institution :
IBM Thomas J. Watson Research Center, Yorktown Heights, NY
Volume :
30
Issue :
11
fYear :
1983
fDate :
11/1/1983 12:00:00 AM
Firstpage :
1527
Lastpage :
1534
Abstract :
Tunneling currents in reverse-biased base-emitter junctions are investigated and analyzed. Guided by a simple analytic theory, shallow n+-p junctions are designed with a variety of different concentration profiles. Measurements of the dc electrical characteristics indicate a significant Zener tunneling component in the reverse diode current. The appearance of tunneling is ascertained by the temperature dependence, which also allows a clear distinction of other current mechanisms. The sensitivity of the current to the details of the doping profile is theoretically explained in terms of the maximum electric field in the junction and verified by SIMS and C-V profiling techniques. The C-V data are analyzed in a novel way to obtain experimental data on the maximum electric field making the conclusions valid for any arbitrary junction. The implications of the presence of high electric fields in shallow junctions are discussed with respect to scaling bipolar transistors.
Keywords :
Bipolar transistors; Capacitance-voltage characteristics; Current measurement; Data analysis; Diodes; Doping profiles; Electric variables; Electric variables measurement; Temperature dependence; Tunneling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1983.21333
Filename :
1483234
Link To Document :
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