• DocumentCode
    1101418
  • Title

    Emitter—Base bandgap grading effects on GaAlAs/GaAs heterojunction bipolar transistor characteristics

  • Author

    Yoshida, Jiro ; Kurata, Mamoru ; Morizuka, Kohei ; Hojo, Akimicmi

  • Author_Institution
    Toshiba Research and Development Center, Kawasaki, Japan
  • Volume
    32
  • Issue
    9
  • fYear
    1985
  • fDate
    9/1/1985 12:00:00 AM
  • Firstpage
    1714
  • Lastpage
    1721
  • Abstract
    Emitter-base bandgap grading effects on GaAlAs/GaAs heterojunction bipolar transistor characteristics are theoretically investigated using an accurate one-dimensional numerical model including aluminum mole-fraction-dependent velocity versus field characteristics and donor energy level. The bandgap grading is shown to influence not only the electron injection but also the carrier recombination and the hole injection, resulting in a significant common-emitter current gain dependence on the graded layer thickness. The cutoff frequency dependence on the graded layer thickness is also described. Detailed discussion is given for the underlying physical mechanism that determines the device performance.
  • Keywords
    Aluminum; Bipolar transistors; Charge carrier processes; Cutoff frequency; Electron mobility; Equations; Gallium arsenide; Heterojunction bipolar transistors; Numerical models; Photonic band gap;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1985.22185
  • Filename
    1484931