DocumentCode
1101418
Title
Emitter—Base bandgap grading effects on GaAlAs/GaAs heterojunction bipolar transistor characteristics
Author
Yoshida, Jiro ; Kurata, Mamoru ; Morizuka, Kohei ; Hojo, Akimicmi
Author_Institution
Toshiba Research and Development Center, Kawasaki, Japan
Volume
32
Issue
9
fYear
1985
fDate
9/1/1985 12:00:00 AM
Firstpage
1714
Lastpage
1721
Abstract
Emitter-base bandgap grading effects on GaAlAs/GaAs heterojunction bipolar transistor characteristics are theoretically investigated using an accurate one-dimensional numerical model including aluminum mole-fraction-dependent velocity versus field characteristics and donor energy level. The bandgap grading is shown to influence not only the electron injection but also the carrier recombination and the hole injection, resulting in a significant common-emitter current gain dependence on the graded layer thickness. The cutoff frequency dependence on the graded layer thickness is also described. Detailed discussion is given for the underlying physical mechanism that determines the device performance.
Keywords
Aluminum; Bipolar transistors; Charge carrier processes; Cutoff frequency; Electron mobility; Equations; Gallium arsenide; Heterojunction bipolar transistors; Numerical models; Photonic band gap;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1985.22185
Filename
1484931
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