DocumentCode
1102069
Title
A general control-volume formulation for modeling impact ionization in semiconductor transport
Author
Laux, Steven E. ; Grossman, Bertrand M.
Author_Institution
IBM Thomas J. Watson Research Center, Yorktown Heights, NY
Volume
32
Issue
10
fYear
1985
fDate
10/1/1985 12:00:00 AM
Firstpage
2076
Lastpage
2082
Abstract
A method for incorporating impact ionization into a general control-volume formulation of semiconductor transport is described. The methods for electric-field and current-density vector evaluation and generated charge partitioning within a two-dimensional triangular element are given. The techniques employed allow device breakdown to be accurately determined independent of mesh orientation to current flow direction. The avalanche breakdown of a 1-µm n-MOSFET illustrates the approach. Regions where the drain current is a multivalued function of drain voltage are directly and self-consistently calculated for this device.
Keywords
Avalanche breakdown; Charge carrier processes; Electric breakdown; Equations; Impact ionization; MOSFET circuits; Numerical simulation; Production; Shape control; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1985.22241
Filename
1484987
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