Title :
IIB-1 the role of stress in two-dimensional silicon oxidation
Author :
Saraswat, Krishna C. ; McVittie, James P. ; Nix, W.D.
fDate :
11/1/1985 12:00:00 AM
Keywords :
Doping; EPROM; Etching; Oxidation; Semiconductor process modeling; Silicon; Stress; Temperature; Testing; Viscosity;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1985.22316
