Title :
IIB-4 CMOS well drive-in NH3for reduced lateral diffusion and heat cycle
fDate :
11/1/1985 12:00:00 AM
Keywords :
Boron; FETs; Fabrication; Gas lasers; Implants; Ion implantation; Resists; Tail; Thermal resistance; Very large scale integration;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1985.22320
