DocumentCode :
1103015
Title :
In-situ epitaxial growth study of Bi2(Sr,Ca)3Cu2Ox films by ion beam sputtering on cleaved MgO substrates
Author :
Fujita, J. ; Yoshitake, T. ; Satoh, T. ; Ichihashi, T. ; Igarashi, H.
Author_Institution :
NEC Corp., Kawasaki, Japan
Volume :
27
Issue :
2
fYear :
1991
fDate :
3/1/1991 12:00:00 AM
Firstpage :
1205
Lastpage :
1210
Abstract :
In-situ epitaxial growth of Bi2(Sr0.6Ca0.4)3Cu2 Ox films on cleaved MgO substrates was studied by ion beam sputtering. The crystallographic structures were analyzed by using in-situ reflection high-energy electron diffraction, a four-circle X-ray diffractometer, and a scanning electron microscope. While the epitaxial films on polished MgO substrates commonly showed the fourfold symmetry, the epitaxial films having the twofold symmetry were successfully grown on the cleaved MgO substrates, and the films contained two types of misoriented domains. The epitaxial relationship between these domains and then cleaved MgO substrates was such that the b-axis of each domain deviated approximately ±13° from [010]MgO where the cleavage steps ran along [100]MgO. The early stage of film growth corresponded to an anisotropic growth mode, and the step edges tended to be the nucleation site. The step edges seemed to play an important role in determining the twofold epitaxial relationship, where the incommensurate modulation tended to align its direction so as to avoid the step edges
Keywords :
X-ray diffraction examination of materials; bismuth compounds; calcium compounds; crystal symmetry; high-temperature superconductors; reflection high energy electron diffraction; scanning electron microscope examination of materials; sputter deposition; strontium compounds; superconducting epitaxial layers; surface structure; vapour phase epitaxial growth; Bi2(Sr0.6Ca0.4)3Cu 2Ox; RHEED; SEM; X-ray diffraction; anisotropic growth mode; b-axis; cleaved MgO substrates; crystallographic structures; films; fourfold symmetry; high temperature superconductors; in-situ epitaxial growth; in-situ reflection high-energy electron diffraction; ion beam sputtering; misoriented domains; nucleation site; polished MgO substrates; step edges; twofold symmetry; Bismuth; Crystallography; Electrons; Epitaxial growth; Ion beams; Optical films; Sputtering; Strontium; Substrates; X-ray diffraction;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.133402
Filename :
133402
Link To Document :
بازگشت