• DocumentCode
    1104149
  • Title

    A new Ga0.47In0.53As field-effect transistor with a lattice-mismatched GaAs gate for high-speed circuits

  • Author

    Chen, C.Y. ; Cho, A.Y. ; Garbinski, P.A.

  • Author_Institution
    AT&T Bell Laboratories, Murray Hill, NJ
  • Volume
    6
  • Issue
    1
  • fYear
    1985
  • fDate
    1/1/1985 12:00:00 AM
  • Firstpage
    20
  • Lastpage
    21
  • Abstract
    A novel thin GaAs lattice-mismatched gate Ga0.47In0.53As field-effect transistor (LMG-FET) is reported. The device shows an extrinsic dc transconductance of 108 mS/mm for a 1.4-µm gate length and 240-µm gate width. Despite a 3.7-percent, lattice mismatch between GaAs and Ga0.47In0.53As, the LMG-FET shows stable operation even at 80°C (with a 13-percent increase in transconductances), exhibits negligible current drift, and suffers very little change in threshold voltages (<0.05 V) under illumination, This technology may find applications in high-speed lightwave transmission as well as high-speed digital circuits.
  • Keywords
    Contact resistance; Electrical resistance measurement; Electron mobility; Gallium arsenide; Intrusion detection; Lattices; Leakage current; Lighting; Threshold voltage; Transconductance;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1985.26028
  • Filename
    1485181