A further comment on "Determining specific contact resistivity from contact end resistance measurements"

The purpose of this comment is to contribute to a better understanding of the influence of lateral current crowding, sheet resistance, and interface pitting in the determination of the interface contact resistivity in four terminal resistor test patterns, for two different metallization schemes, i.e., 1Al/n⁺Si and (Al + 1.5-percent Si)/n⁺Si.