• DocumentCode
    1105233
  • Title

    Multiple-channel GaAs/AlGaAs high electron mobility transistors

  • Author

    Sheng, N.H. ; Lee, C.P. ; Chen, R.T. ; Miller, D.L. ; Lee, S.J.

  • Author_Institution
    Rockwell International Corporation, Thousand Oaks, CA
  • Volume
    6
  • Issue
    6
  • fYear
    1985
  • fDate
    6/1/1985 12:00:00 AM
  • Firstpage
    307
  • Lastpage
    310
  • Abstract
    Multiple-channel high electron mobility transistors (HEMT´s) have been designed and fabricated on GaAs/AlGaAs heterostructural material grown by molecular beam epitaxy (MBE). The sheet carrier density of the two-dimensional electron gas (2-DEG) measured at 77 K was linearly proportional to the number of high mobility electron channels, and reached 5.3 × 1012cm-2for six-channel HEMT structures. Depletion-mode devices of the double-heterojunction HEMT were operated between negative pinchoff voltage and forward-biased gate voltage without any transconductance degradation. A peak extrinsic transconductance of 360 mS/mm at 300 K and 550 mS/mm at 77 K has been measured for a 1-µm gate-length double-heterojunction enhancement-mode device. An extremely high drain current of 800 mA/mm with a gate-to-drain avalanche breakdown voltage of 9 V was measured on six-channel devices.
  • Keywords
    Charge carrier density; Density measurement; Electron mobility; Gallium arsenide; HEMTs; MODFETs; Molecular beam epitaxial growth; Sheet materials; Transconductance; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1985.26134
  • Filename
    1485287