DocumentCode
1106865
Title
A high-performance high-voltage self-aligned double-diffused lateral (SADDL) p-n-p transistor
Author
Sugawara, Yoshitaka ; Kamei, Tatsuya
Author_Institution
Hitachi Research Laboratory, Hitachi, Ibaraki, Japan
Volume
33
Issue
1
fYear
1986
fDate
1/1/1986 12:00:00 AM
Firstpage
23
Lastpage
27
Abstract
A new lateral transistor, the self-aligned double diffused lateral (SADDL) transistor was devdoped for high-voltage linear IC´s. It has a self-aligned narrow n-base to provide high hFE and high fT , and an electric field reducible p-collector and electrodes to provide high BVceo . It was confirmed that fT of the SADDL transistor was improved without deterioration of BVceo by more than ten times that for other reported lateral transistors. A fabricated SADDL transistor of the 350 V class has a high hFE (∼100), high fT (∼15 MHz), and high Early voltage ( > 1000 V).
Keywords
Bandwidth; Boron; Circuits; Diffusion processes; Electrodes; Fabrication; Ion implantation; Laboratories; Low voltage; Transistors;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1986.22431
Filename
1485648
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