• DocumentCode
    1106865
  • Title

    A high-performance high-voltage self-aligned double-diffused lateral (SADDL) p-n-p transistor

  • Author

    Sugawara, Yoshitaka ; Kamei, Tatsuya

  • Author_Institution
    Hitachi Research Laboratory, Hitachi, Ibaraki, Japan
  • Volume
    33
  • Issue
    1
  • fYear
    1986
  • fDate
    1/1/1986 12:00:00 AM
  • Firstpage
    23
  • Lastpage
    27
  • Abstract
    A new lateral transistor, the self-aligned double diffused lateral (SADDL) transistor was devdoped for high-voltage linear IC´s. It has a self-aligned narrow n-base to provide high hFEand high fT, and an electric field reducible p-collector and electrodes to provide high BVceo. It was confirmed that fTof the SADDL transistor was improved without deterioration of BVceoby more than ten times that for other reported lateral transistors. A fabricated SADDL transistor of the 350 V class has a high hFE(∼100), high fT(∼15 MHz), and high Early voltage ( > 1000 V).
  • Keywords
    Bandwidth; Boron; Circuits; Diffusion processes; Electrodes; Fabrication; Ion implantation; Laboratories; Low voltage; Transistors;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1986.22431
  • Filename
    1485648