• DocumentCode
    1107876
  • Title

    Low-frequency pseudogeneration—Recombination noise of MOSFET´s stressed by channel hot electrons in weak inversion

  • Author

    Fang, Zhi-Hao

  • Author_Institution
    University of Wuhan, Wuhan, Peoples Republic of China
  • Volume
    33
  • Issue
    4
  • fYear
    1986
  • fDate
    4/1/1986 12:00:00 AM
  • Firstpage
    516
  • Lastpage
    519
  • Abstract
    Up to now, the effect of trap distribution over distance in the oxide on low-frequency noise has not been verified experimentally. In this paper, a new method to detect the pseudo-g-r noise, caused by a nonuniform trap distribution, is proposed using MOSFET´s stressed by channel hot electrons. The experimental results are interpreted well by the early given theories and show that the pseudo-g-r noise can be obtained provided that the MOSFET´s are aged sufficiently by electrical stress and operate in weak inversion.
  • Keywords
    Capacitance; Cutoff frequency; Electron traps; Fluctuations; Low-frequency noise; Noise generators; Noise shaping; Semiconductor device noise; Shape; Stress;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1986.22521
  • Filename
    1485738