DocumentCode :
1110393
Title :
Photogeneration and recombination in a bulk barrier phototransistor
Author :
Chang, C.Y.
Author_Institution :
National Cheng Kung University, Tainan, Taiwan, Republic of China
Volume :
33
Issue :
11
fYear :
1986
fDate :
11/1/1986 12:00:00 AM
Firstpage :
1829
Lastpage :
1830
Abstract :
Photogeneration and recombination processes have been taken into consideration for the amorphous silicon bulk barrier phototransistors. Based on the developed model, optimum conditions to obtain maximum gain are reported and are experimentally verified. Trapping in the collector updoped region and at the minimum of the valance band barrier play an important role in the current gain and the response speed.
Keywords :
Amorphous silicon; Charge carrier processes; Electrodes; Electron emission; Gallium arsenide; Glass; Lighting; Niobium; Phototransistors; Radiative recombination;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1986.22750
Filename :
1485967
Link To Document :
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