DocumentCode
1114435
Title
A two-dimensional analytical model of the cross-bridge Kelvin resistor
Author
Schreyer, Tim A. ; Saraswat, Krishna C.
Author_Institution
Stanford University, Stanford, CA
Volume
7
Issue
12
fYear
1986
fDate
12/1/1986 12:00:00 AM
Firstpage
661
Lastpage
663
Abstract
This paper presents an analytical model which correctly explains the two-dimensional (2-D) current-crowding effects observed in the cross-bridge Kelvin resistor (CBKR). The model explains that the kelvin resistance measured by this device consists of two components, one due to specific resistivity and the other due to current flowing in the overlap region between the contact and the diffusion edges. The geometrical dependence of this second component is derived analytically and compared with two-dimensional numerical simulations. It becomes significant when specific contact resistivity
, where δ is the amount of overlap between edge of the contact and the edge of the diffusion path, and Rs is the diffusion sheet resistance.
, where δ is the amount of overlap between edge of the contact and the edge of the diffusion path, and RKeywords
Analytical models; Conductivity; Contact resistance; Current measurement; Electrical resistance measurement; Geometry; Kelvin; Numerical simulation; Resistors; Two dimensional displays;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1986.26511
Filename
1486334
Link To Document