DocumentCode :
1116585
Title :
A high-power high-gain VD-MOSFET operating at 900 MHz
Author :
Ishikawa, Osamu ; Esaki, Hideya
Author_Institution :
Matsushita Electric Industrial Co., Ltd., Moriguchi, Osaka, Japan
Volume :
34
Issue :
5
fYear :
1987
fDate :
5/1/1987 12:00:00 AM
Firstpage :
1157
Lastpage :
1162
Abstract :
A new vertical double-diffused MOSFET (VD-MOSFET) capable of delivering output power of 100 W at 900 MHz has been developed. It offers the gain of 8 dB and the drain efficiency of 45 percent. The double diffusion self-aligned to the gate allows the devices to control the formation of the submicrometer channel essential for the high transconductance, hence the high gain, with minimum gate-to-source capacitance (Cgs). The device utilizes MoSi2for both gate electrodes and shield plates imbedded beneath the CVD oxide in the gate pad region. Low resistivity gate reduces the extra power dissipation to drive the gate, while the shield plate lowers the gate-to-drain capacitance (Cgd) to half. A maximum output power has been realized by the 12 blocks of VD-MOSFET´s. They are mounted on the two BeO plates packaged with internal input matching circuits, and the power is measured in a push-pull amplifier.
Keywords :
Capacitance; Conductivity; Electrodes; Gain; MOSFET circuits; Power MOSFET; Power amplifiers; Power dissipation; Power generation; Transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1987.23058
Filename :
1486769
Link To Document :
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