• DocumentCode
    1117355
  • Title

    A high-speed 1-kbit high electron mobility transistor static RAM

  • Author

    Sheng, N.H. ; Wang, H.T. ; Lee, C.P. ; Sullivan, G.J. ; Miller, D.L.

  • Author_Institution
    Rockwell International Science Center, Thousand Oaks, CA
  • Volume
    34
  • Issue
    8
  • fYear
    1987
  • fDate
    8/1/1987 12:00:00 AM
  • Firstpage
    1670
  • Lastpage
    1675
  • Abstract
    A 1-kbit static RAM with enhancement and depletion-mode devices was designed and fabricated using the high electron mobility transistor (HEMT) technology. The RAM circuit was optimized to achieve ultra-high-speed performance. A subnanosecond address access time of 0.6 ns was measured at room temperature for a total power dissipation of 450 mW. The minimum WRITE-ENABLE pulse width required to change the state of memory cell is less than 2 ns on probe testing. The best chip has 3 bits that failed to function, which corresponds to a bit yield of 99.7 percent. According to the simulation, variations of the threshold voltage inside the memory cell greatly reduce its stable functional range. High-speed operation requires more uniform threshold voltage control to achieve fully operational LSI memory circuits.
  • Keywords
    Circuits; HEMTs; MODFETs; Power dissipation; Power measurement; Read-write memory; Semiconductor device measurement; Temperature measurement; Threshold voltage; Time measurement;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1987.23135
  • Filename
    1486846