• DocumentCode
    1117990
  • Title

    A supervised simulation system for process and device designs based on a geometrical data interface

  • Author

    Kato, Koichi ; Shigyo, Naoyuki ; Wada, Tetsunori ; Onga, Shinji ; Konaka, Masami ; Taniguchi, Kenji

  • Author_Institution
    Toshiba Corporation, Kawasaki, Japan
  • Volume
    34
  • Issue
    10
  • fYear
    1987
  • fDate
    10/1/1987 12:00:00 AM
  • Firstpage
    2049
  • Lastpage
    2058
  • Abstract
    A supervised simulation system for two-dimensional simulation has been developed covering the range from pattern layout to process simulation and also to device simulation. The system features a system controller for module programs, and the feasibility of module programs based on an intermediate topography data format with which data go between the module programs. The system controller can automatically generate appropriate jobs, assigning pertinent input data. The topography data acts as an interface through process simulation and up to device simulation. The system will eliminate laborious work for designers and greatly reduce the time required for process and device designs.
  • Keywords
    Application software; Computational modeling; Control systems; Data structures; Etching; Predictive models; Process design; Solid modeling; Surfaces; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1987.23198
  • Filename
    1486909