DocumentCode
1117990
Title
A supervised simulation system for process and device designs based on a geometrical data interface
Author
Kato, Koichi ; Shigyo, Naoyuki ; Wada, Tetsunori ; Onga, Shinji ; Konaka, Masami ; Taniguchi, Kenji
Author_Institution
Toshiba Corporation, Kawasaki, Japan
Volume
34
Issue
10
fYear
1987
fDate
10/1/1987 12:00:00 AM
Firstpage
2049
Lastpage
2058
Abstract
A supervised simulation system for two-dimensional simulation has been developed covering the range from pattern layout to process simulation and also to device simulation. The system features a system controller for module programs, and the feasibility of module programs based on an intermediate topography data format with which data go between the module programs. The system controller can automatically generate appropriate jobs, assigning pertinent input data. The topography data acts as an interface through process simulation and up to device simulation. The system will eliminate laborious work for designers and greatly reduce the time required for process and device designs.
Keywords
Application software; Computational modeling; Control systems; Data structures; Etching; Predictive models; Process design; Solid modeling; Surfaces; Very large scale integration;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1987.23198
Filename
1486909
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