Title :
Semiconductor-gated InGaAs/InAlAs heterostructure transistors (SISFET´s)
Author :
Feuer, M.D. ; Chang, Tao-yuan ; Shunk, S.C. ; Tell, B.
Author_Institution :
AT&T Bell Laboratories, Holmdel, NJ
fDate :
1/1/1987 12:00:00 AM
Abstract :
We have successfully fabricated FET´s with In0.53Ga0.47As channels, lattice-matched In0.52Al0.48As gate barriers, and n+ In0.53- Ga0.47As gates. For a barrier thickness of 600 Å and a gate length of 1.7 µm, the maximum transconductance is 250 mS/mm at T = 300 K. From gate capacitance measurements, the cutoff frequency is inferred to be ft= 15 GHz for this gate length. Self-aligned source and drain implants have been used to permit nonalloyed ohmic contacts with a characteristic resistance of 0.1 Ω.mm. The transconductance remains above 210 mS/mm for forward gate bias up to +1.0 V, confirming the usefulness of this gate structure for enhancement-mode devices.
Keywords :
Argon; Contact resistance; Etching; HEMTs; Implants; Indium compounds; Indium gallium arsenide; MODFET circuits; Ohmic contacts; Transconductance;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1987.26541