DocumentCode :
1120088
Title :
High-transconductance p-channel InGaAs/AlGaAs modulation-doped field effect transistors
Author :
Lee, Chien-Ping ; Wang, H.T. ; Sullivan, G.J. ; Sheng, N.H. ; Miller, D.L.
Author_Institution :
Rockwell International Science Center, Thousand Oaks, CA
Volume :
8
Issue :
3
fYear :
1987
fDate :
3/1/1987 12:00:00 AM
Firstpage :
85
Lastpage :
87
Abstract :
A p-channel quantum-well InGaAs/AlGaAs modulation-doped field effect transistor has been fabricated. With a 1-µm gate, the device exhibits transconductances of 17.8 and 89 mS/mm at room temperature and 77 K, respectively. Experimental results indicate an extrinsic transconductance greater than 200 mS/mm is achievable with reduced ohmic contact resistance and gate leakage.
Keywords :
Epitaxial layers; FETs; Gallium arsenide; HEMTs; Indium gallium arsenide; MODFETs; Ohmic contacts; Plasma temperature; Threshold voltage; Transconductance;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1987.26560
Filename :
1487110
Link To Document :
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