Directed killing of anthrax spores by microwave-induced cavitation

Author

Kiel, Johnathan L. ; Sutter, Richard E. ; Mason, Patrick A. ; Parker, Jill E. ; Morales, Pedro J. ; Stribling, Lucille J V ; Alls, John L. ; Holwitt, Eric A. ; Seaman, Ronald L. ; Mathur, Satnam P.

Author_Institution

Air Force Res. Lab., Brooks, TX, USA

Volume

30

Issue

4

fYear

2002

fDate

8/1/2002 12:00:00 AM

Firstpage

1482

Lastpage

1488

Abstract

High-power pulsed-microwave radiation damages anthrax spores by apparent sonoluminescence in aqueous solutions containing the organic semiconductor diazoluminomelanin (DALM). DALM biosynthesized by JM109 E. coli, containing the plasmid pIC2ORNR_1.1, had a higher affinity for spores of Sterne strain anthrax when compared to several other species of bacilli and enhanced the effect. Upon exposure to pulsed-microwave radiation, anthrax spores showed a maximum of 4 to 5 (i.e., 4.6) logs of kill. The light emitted was typical of plasma gas emissions and the spores, upon scanning electron-microscopic examination, showed enlargement and rupture typical of rapid expansion. Therefore, microwave-induced cavitations localized to the spore surfaces enhanced kill.

Keywords

biological effects of microwaves; biological techniques; cavitation; cellular biophysics; microorganisms; organic semiconductors; sonoluminescence; JM109 E. coli; Sterne strain anthrax; anthrax spores; aqueous solutions; bacilli; diazoluminomelanin; directed killing; enlargement; expansion; high-power pulsed-microwave radiation; light emission; localized microwave-induced cavitations; microwave-induced cavitation; microwaves; organic semiconductor; pIC2ORNR_1.1 plasmid; plasma gas emissions; pulsed-microwave radiation exposure; rupture; scanning electron microscopy; scanning electron-microscopic examination; sonoluminescence; spore surfaces; spores; Biological materials; Biomedical materials; Capacitive sensors; Chemical technology; Fungi; Magnetic field induced strain; Microwave filters; Organic semiconductors; Plasmas; Reactive power;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2002.804207

Filename

1167643