DocumentCode
1127747
Title
Modeling and Optimization of the Deposition of Shape Memory Polymers for Information Storage Applications
Author
Wornyo, Edem ; May, Gary S. ; Gall, Ken
Author_Institution
Syst. & Technol. Group, IBM Microelectron., Hopewell Junction, NY, USA
Volume
22
Issue
3
fYear
2009
Firstpage
409
Lastpage
416
Abstract
Shape memory polymers are of interest as high-capacity information storage media. This paper seeks to understand the effects of processing conditions on diethylene glycol dimethacrylate (DEGDMA) and bisphenol A ethoxylate dimethacrylate. Full factorial experiments are performed to characterize the impact of the following parameters: spin speed, spin time, and nitrogen flow rate. A total of ten experiments are conducted. The measured responses are film thickness, uniformity, hardness and modulus. Analysis of variance reveals the above input parameters are significant with respect to the output responses. The full factorial experiment is augmented by a central composite face centered (CCF) design to facilitate process modeling. Neural network models are developed to examine relationships. The average predictability of the models is better than 2% for training and less than 15% in testing. Genetic algorithms are used in optimizing recipes for the two materials.
Keywords
genetic algorithms; hardness; neural nets; optimisation; polymer films; shape memory effects; storage media; bisphenol A ethoxylate dimethacrylate; central composite face centered design; diethylene glycol dimethacrylate; film thickness; full factorial experiments; genetic algorithm; hardness; information storage applications; neural network; nitrogen flow rate; optimization; shape memory polymers; spin speed; spin time; Genetic algorithms; MEMS; nanotechnology; neural networks; optimization; shape memory polymers;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/TSM.2009.2024902
Filename
5159412
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