• DocumentCode
    1128619
  • Title

    A novel MCVD process control technique

  • Author

    Smithgall, David H. ; Miller, T.J. ; Frazee, Ralph E., Jr.

  • Author_Institution
    AT&T Technologies, Engineering Research Center, Princeton, NJ, USA
  • Volume
    4
  • Issue
    9
  • fYear
    1986
  • fDate
    9/1/1986 12:00:00 AM
  • Firstpage
    1360
  • Lastpage
    1366
  • Abstract
    A new technique for measuring and controlling the sintering zone in the MCVD process is described. The method results in uniform internal processing conditions over a wide range of deposition conditions.
  • Keywords
    Optical fiber materials/fabrication; Process control; Chemical processes; Equations; Fires; Fluid flow; Glass; Optical control; Process control; Silicon compounds; Temperature control; Temperature measurement;
  • fLanguage
    English
  • Journal_Title
    Lightwave Technology, Journal of
  • Publisher
    ieee
  • ISSN
    0733-8724
  • Type

    jour

  • DOI
    10.1109/JLT.1986.1074892
  • Filename
    1074892
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1128619