DocumentCode :
113807
Title :
Design, fabrication and characterization of capacitive RF MEMS switches with low pull-in voltage
Author :
Shekhar, S. ; Vinoy, K.J. ; Ananthasuresh, G.K.
Author_Institution :
Dept. of Electr. & Commun. Eng., Indian Inst. of Sci., Bangalore, India
fYear :
2014
fDate :
15-17 Dec. 2014
Firstpage :
182
Lastpage :
185
Abstract :
The dielectric charging caused by high actuation voltages is one of the reasons behind the poor reliability of capacitive MEMS switches. This paper reports the design, fabrication and characterization of an RF MEMS switch with a very low-actuation voltage and high isolation. The device is fabricated on a glass substrate using a four mask surface micromachining process. The electromechanical characterization reveals a very low pull-in voltage of 4.8 V for the fabricated device. The RF measurement results show an insertion loss of 0.55 dB and an isolation of -47.6 dB at 40 GHz. The excellent RF performance makes these switches a suitable choice for very high frequency (K-band and above) applications.
Keywords :
micromachining; microswitches; microwave switches; capacitive RF MEMS switch; dielectric charging; glass substrate; high actuation voltage; low pull-in voltage MEMS switch; low-actuation voltage; mask surface micromachining process; voltage 4.8 V; Dielectrics; Fabrication; Loss measurement; Micromechanical devices; Microswitches; Radio frequency; Semiconductor device measurement; Capacitive switch; RF MEMS; insertion loss; isolation; pull-in voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and RF Conference (IMaRC), 2014 IEEE International
Conference_Location :
Bangalore
Type :
conf
DOI :
10.1109/IMaRC.2014.7038983
Filename :
7038983
Link To Document :
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