DocumentCode :
1141428
Title :
Room-temperature single-electron memory
Author :
Yano, Kazuo ; Ishii, Tomoyuki ; Hashimoto, Takashi ; Kobayashi, Takashi ; Murai, Fumio ; Seki, Koichi
Author_Institution :
Central Res. Lab., Hitachi Ltd, Tokyo, Japan
Volume :
41
Issue :
9
fYear :
1994
fDate :
9/1/1994 12:00:00 AM
Firstpage :
1628
Lastpage :
1638
Abstract :
This paper presents room-temperature operation, for the first time, of single-electron memory, in which one electron represents one bit of information. This is made possible by our new one-transistor memory configuration which has a very high charge sensitivity (conventionally, three circuit elements are needed). Another new technique, which facilitates single-electron memory, is the ultra-thin (3.4 nm) poly-Si film used for the active region, in which sub-10-nm-width current channels and storage dots are naturally formed. In the fabricated poly-Si TFT´s a single electron is stored (or “written”) on a low-energy silicon island, and the number of stored electrons is counted (or “read”) by the quantized threshold-voltage shift. Single-electron memory provides the potential for new nonvolatile RAM´s, suitable for mobile computers/communicators
Keywords :
elemental semiconductors; integrated memory circuits; random-access storage; semiconductor storage; semiconductor thin films; silicon; thin film transistors; Si; active region; charge sensitivity; nonvolatile RAMs; one-transistor memory configuration; polysilicon TFTs; polysilicon film; quantized threshold-voltage shift; room-temperature operation; single-electron memory; Circuits; Electrodes; Personal digital assistants; Reservoirs; Silicon; Single electron devices; Single electron memory; Temperature; Thin film transistors; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.310117
Filename :
310117
Link To Document :
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