• DocumentCode
    1152902
  • Title

    High-Frequency ZnO Thin-Film Transistors on Si Substrates

  • Author

    Bayraktaroglu, Burhan ; Leedy, Kevin ; Neidhard, Robert

  • Author_Institution
    Air Force Res. Lab., AFRL/RYDD, Wright Patterson AFB, OH, USA
  • Volume
    30
  • Issue
    9
  • fYear
    2009
  • Firstpage
    946
  • Lastpage
    948
  • Abstract
    Record microwave frequency performance was achieved with nanocrystalline ZnO thin-film transistors fabricated on Si substrates. Devices with 1.2-mum gate lengths and Au-based gate metals had current and power gain cutoff frequencies of fT = 2.45 GHz and fmax = 7.45 GHz, respectively. Same devices had drain-current on/off ratios of 5 times1010 exhibited no hysteresis effects and could be operated at a current density of 348 mA/mm. The microwave performances of devices with 1.2- and 2.1- mum gate lengths and 50- and 100-mum gate widths were compared.
  • Keywords
    microwave transistors; silicon; substrates; thin film transistors; zinc compounds; Si; ZnO; current density; drain-current on/off ratios; frequency 2.45 GHz; frequency 7.45 GHz; high-frequency thin-film transistors; microwave performances; power gain; silicon substrates; size 1.2 mum; size 100 mum; size 2.1 mum; size 50 mum; FET; ZnO; high frequency; microwave; nanocrystalline; on/off ratio; pulsed laser deposition; thin-film transistors (TFTs);
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2009.2025672
  • Filename
    5175422