Numerical modeling of glass flow and spin-on planarization

Author

Leon, Francisco A.

Author_Institution

Intel Corp., Santa Clara, CA, USA

Volume

7

Issue

2

fYear

1988

fDate

2/1/1988 12:00:00 AM

Firstpage

168

Lastpage

173

Abstract

A model for the flow of phosphosilicate glass (PSG) and borophosphosilicate glass (BPSG) has been developed and integrated into the SAMPLE process simulation program. The physical basis of the model is the deformation of the glass in such a way as to decrease the surface free energy; the kinetics of the deformation are assumed to be controlled by a surface diffusion process. The model is applicable to 2-D and quasi-3-D (cylindrically symmetric) structures. In addition, a related model has been developed for spin-on glass, polyimide, and photoresist. The theory of these models is discussed, and examples of simulations using these models are presented

Keywords

borosilicate glasses; electronic engineering computing; non-Newtonian flow; phosphosilicate glasses; semiconductor technology; surface diffusion; 2D structures; B2O3-P2O5-SiO2; BPSG; P2O5-SiO2; PSG; SAMPLE process simulation program; borophosphosilicate glass; glass flow; numerical modelling; phosphosilicate glass; photoresist; polyimide; quasi-3D structures; spin-on planarization; surface diffusion; surface free energy; Deformable models; Diffusion processes; Glass; Kinetic theory; Lithography; Numerical models; Planarization; Polyimides; Resists; Semiconductor device modeling; Surface topography;

fLanguage

English

Journal_Title

Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on

Publisher

ieee

ISSN

0278-0070

Type

jour

DOI

10.1109/43.3146

Filename

3146