DocumentCode
1163724
Title
A simple technique to induce and control short pulses of deep drain-source breakdown conditions
Author
Krieger, Gadi
Author_Institution
VLSI Technol. Inc., San Jose, CA, USA
Volume
10
Issue
1
fYear
1989
Firstpage
39
Lastpage
41
Abstract
A simple method to induce drain-source breakdown, followed by the parasitic bipolar action, is reported for time intervals and energies sufficiently small to avoid thermal runaway. A relatively large capacitor, connected in parallel to the device under test, is charged up using a sufficiently large resistor and discharges automatically as the breakdown voltage (BV/sub DSS/) is reached, thus eliminating the need for a fast and ´ringing-free´ switch in the test setup. Since the discharge process is controlled by the small dynamic device resistance, rather than the large external resistor, the resulting transitions are fast enough and therefore compatible with electrostatic discharge (ESD) or latch-up turn-on conditions. Such pulses were successfully used to study soft ESD damage in lightly-doped-drain (LDD) devices, using simple on-wafer probing.<>
Keywords
electric breakdown of solids; electrostatic discharge; insulated gate field effect transistors; semiconductor device testing; LDD transistor; NMOS transistor; breakdown voltage; capacitor; device under test; discharge process; drain-source breakdown; dynamic device resistance; electrostatic discharge; latch-up turn-on conditions; on-wafer probing; parasitic bipolar action; soft ESD damage; Automatic testing; Capacitors; Electric breakdown; Electrostatic discharge; Fault location; Protection; Resistors; Switches; Transmission lines; Voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.31675
Filename
31675
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