DocumentCode :
1169471
Title :
Dynamic degradation in MOSFET´s. II. Application in the circuit environment
Author :
Weber, Werner ; Brox, Martin ; Künemund, Thomas ; Muhlhoff, M. ; Schmitt-Landsiedel, Doris
Author_Institution :
Siemens AG, Muenchen, Germany
Volume :
38
Issue :
8
fYear :
1991
fDate :
8/1/1991 12:00:00 AM
Firstpage :
1859
Lastpage :
1867
Abstract :
For pt.I, see ibid., vol.38 no.8, pp.1852-1858, Aug. 1991. The physical effects discussed in Pt.I are classified with respect to real operation of devices in circuits from an engineer´s viewpoint. Stress results from different kinds of logic stages are discussed and relations set up between static and dynamic lifetimes. It is shown that within certain limited error boundaries, the static approach is essentially valid as long as stress conditions are considered that are oriented to operation in digital logic. The transmission gate is investigated separately, because in this case specific phenomena caused by bidirectional stress must be considered
Keywords :
CMOS integrated circuits; digital integrated circuits; insulated gate field effect transistors; reliability; semiconductor device models; MOSFETs; bidirectional stress; circuit environment; digital logic; dynamic degradation; dynamic lifetimes; engineer´s viewpoint; physical effects; real operation of devices in circuits; static approach; stress conditions; transmission gate; Cost function; Degradation; Hot carrier effects; Hot carriers; Logic devices; MOSFET circuits; Manufacturing processes; Random access memory; Stress; Vehicle dynamics;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.119026
Filename :
119026
Link To Document :
بازگشت