Title :
Evaluation of the Delamination in a Flip Chip Using Anisotropic Conductive Adhesive Films Under Moisture/Reflow Sensitivity Test
Author :
Ikeda, Toru ; Kim, Won-Keun ; Miyazaki, Noriyuki
Author_Institution :
Dept. of Mech. Eng. & Sci., Kyoto Univ.
Abstract :
Anisotropic conductive adhesive films (ACFs) have been used for electronic assemblies such as the connection between a liquid crystal display panel and a flexible printed circuit board. ACF interconnection is expected to be a key technology for flip chip packaging, system-in-packaging, and chip size packaging. This paper presents a methodology for quantitative evaluation of the delamination in a flip chip interconnected by an ACF under moisture/reflow sensitivity tests. Moisture concentration after moisture absorption was obtained by the finite element method. Then, the vapor pressure in the flip chip during solder reflow process was estimated. Finally the delamination was predicted by comparing the stress intensity factor of an interface crack due to vapor pressure with the delamination toughness. It is found that the delamination is well predicted by the present methodology
Keywords :
adhesives; delamination; finite element analysis; flip-chip devices; polymer films; reflow soldering; ACF interconnection; anisotropic conductive adhesive films; chip size packaging; delamination evaluation; delamination toughness; electronic assemblies; finite element method; flip chip packaging; interface crack; moisture absorption; moisture concentration; moisture sensitivity test; reflow sensitivity test; solder reflow process; stress intensity factor; system-in-packaging; Anisotropic conductive films; Anisotropic magnetoresistance; Assembly; Circuit testing; Conductive adhesives; Delamination; Electronics packaging; Flip chip; Integrated circuit interconnections; Moisture; Anisotropic conductive adhesive films (ACFs); delamination toughness; flip chip; moisture/reflow sensitivity test; reliability; stress intensity factor;
Journal_Title :
Components and Packaging Technologies, IEEE Transactions on
DOI :
10.1109/TCAPT.2006.880510