DocumentCode :
1170621
Title :
Operation voltage dependence of memory cell characteristics in fully depleted floating-body cell
Author :
Shino, Tomoaki ; Ohsawa, Takashi ; Higashi, Tomoki ; Fujita, Katsuyuki ; Kusunoki, Naoki ; Minami, Yoshihiro ; Morikado, Mutsuo ; Nakajima, Hiroomi ; Inoh, Kazumi ; Hamamoto, Takeshi ; Nitayama, Akihiro
Author_Institution :
SoC R&D Center, Toshiba Corp., Yokohama, Japan
Volume :
52
Issue :
10
fYear :
2005
Firstpage :
2220
Lastpage :
2226
Abstract :
A one-transistor memory cell on silicon-on-insulator, called floating-body cell (FBC), has been developed and demonstrated. Threshold voltage difference between the "0"-state and the "1"-state, which is a key parameter for realizing a large-scale memory by FBCs, is measured and analyzed using a 96 kb array diagnostic monitor (ADM). A function test of the ADM yielded a fail-bit probability of 0.002%. A new metric relating to the fail-bit probability, that is, the ratio of the threshold voltage difference over the total threshold voltage variation, is introduced and applied to the measurement results. Read current distributions are also evaluated for various operation voltages. This paper also investigates substrate bias dependence of the threshold voltage unique to fully-depleted devices. Channel impurity and substrate impurity concentration dependence of the threshold voltage are analyzed based on experimental data and device simulation.
Keywords :
MOS memory circuits; current distribution; impurity distribution; random-access storage; silicon-on-insulator; array diagnostic monitor; channel impurity concentration dependence; fail-bit probability; fully depleted floating-body cell; large-scale memory; memory cell characteristics; one-transistor memory cell; operation voltage dependence; read current distribution; silicon-on-insulator; substrate bias dependence; substrate impurity concentration dependence; Analytical models; Boron; Current distribution; Fabrication; Impurities; Large-scale systems; MOSFETs; Silicon on insulator technology; Substrates; Threshold voltage; Distribution; MOSFETs; random access memories; silicon-on-insulator (SOI) technology; threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2005.856808
Filename :
1510912
Link To Document :
بازگشت