Title :
Optical scanner on a three-dimensional microoptical bench
Author :
Sasaki, Minoru ; Yamaguchi, T. ; Song, J.-H. ; Hane, K. ; Hara, M. ; Hori, K.
Author_Institution :
Dept. of Mechatronics & Precision Eng., Tohoku Univ., Sendai, Japan
fDate :
3/1/2003 12:00:00 AM
Abstract :
A three-dimensional (3-D) microoptical bench prepared using bulk micromachining is constructed demonstrating a compact optical setup. Prealigned microstructures with space for mounting bulk elements are prepared. A 3-D photolithographic technique is applied with good repeatability using an originally developed resist spray-coating system. Films grown by low-pressure chemical-vapor deposition (LPCVD) are used as construction layers combining with 3-D bulk structures. A skew micromirror at the free end of a thermally actuated cantilever is fabricated facing to a laser diode chip. An optical-scan angle of more than 30° and a cutoff frequency of 100 Hz are obtained.
Keywords :
chemical vapour deposition; micro-optics; micromachining; micromirrors; optical fabrication; optical scanners; photolithography; spray coatings; 3-D microoptical bench; 3D photolithographic technique; LPCVD; bulk micromachining; cutoff frequency; laser diode chip; low-pressure chemical-vapor deposition; optical scanner; optical-scan angle; prealigned microstructures; repeatability; resist spray-coating system; skew micromirror; thermally actuated cantilever; three-dimensional microoptical bench; Micromachining; Micromirrors; Optical devices; Optical films; Optical propagation; Optical refraction; Optical sensors; Resists; Spraying; Substrates;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2003.811793
